e-Ion Plasma™ Advanced Gen3 LIP System
About the Cascade e-Ion Gen3 LIP System
The e-Ion Plasma LIP GEN3 system allows rapid treating of softer materials such as plastics and bottles. With a highly configurable plume, including an adjustable aperture. The LIP system can be configured for a number of applications that require high energy efficiency and rapid processing.
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| Cascade e-Ion Gen3 LIP System Specifications. G models. |
| 200K/s Heat-up Rate |
| 10-15 kW Power Consumption (Depending on Configuration) |
| Highly Modular |
| Highly Accurate Controls |
| No Water Cooling Required |
| Ability to Treat Ungrounded Metals |
| Stainless Steel Construction, Integrated Fan |
| No Toxic Emissions or Combustion Residues |
| CleanElectricFlame™ Uses 220/230/240 Input Voltages |
| Single Phase or 3 Phase |
| Near Silent Operation |
| Plume Properties Recombination Temperature ~2500°K but not the t/c reading Convective Plasma (variable gas temperature is up to 1600°K) Heat Transfer Coefficient ~225W/m^2.K.(Compare to 10W/m^2.K) |
Example of Plasma Formation - N2+E ->N2++ e or Possible species include O2, N2, O2+ , N2+ , N, O, N+, O+, e−, in e-Ion Plasma of air Possible species include N2, N2+ , N+, e−, in e-Ion Plasma of nitrogen. Many elemental or molecular gasses/species can be ionized including Ar, Xe, H2O and others.
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Gen3 LIP and other Cascade e-Ion Photos.
Side by Side LIP GEN3 Units in Operation
Opposing LIP GEN3 Units and Conveyor
Cascade e-Ion Gen3 LIP System Applications
| Source Applications | |
| Computer Chips and Integrated Circuits | Waste Processing, Waste Gas Processing, Chemical Radical Influencer. |
| Computer Hard Drives | Coatings and Films |
| Aluminum Treatment | No Ground Heat Treating |
| Electronics RTP Devices Heat >100°C/minute (substrate dependent) | Advanced Materials (e.g. Ceramics) |
| Machine Tools | Surface Cleaning |
| Medical Implants and Prosthetics | High-efficiency Lighting |
| Audio and Video Tapes | Plasma Enhanced Chemistry |
| Automobile and other High-Value Engine Parts | Processing of Plastics |
| Printing on Plastic Food Containers | Gas Treatment |
| Energy-efficient Window Coatings | Spraying of Materials |
| Cleaning Drinking Water | Chemical Analysis |
| Voice and Data Communications Components | Semiconductor Production for Computers |
| Anti-scratch and anti-glare coatings on eyeglasses and other optics | TV and Electronics |
| Microbial Cleaning. (Please request USDA information). | Custom Applications |
Cascade e-Ion Gen3 LIP System Models
| Cascade e-Ion Gen3 LIP System Models | ||
| Model # | Voltage | kW |
| G-S-e-10 or G-S-e-14 | 208/220/230/240 | 10-16 Depending on Model |
The Cascade-e-Ion systems allow for continuous sintering (3Dsintering™) or hardfacing without the use of hydrogen. All ionic gasses are of a reducing kind.
Plasma polymerization of many unique polymers and Glass surface conditioning.