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e-Ion Plasma™ Source
What is e-Ion Plasma™? - Features of Plasma Brochure - Extremely Wide Area Plasma (with LIP)
e-Ion Plasma™ allows for unique applications of Ions, Electrons, Radiation and hot gases. All e-Ion Plasma™ devices feature a Clean ElectricFlame™ powered by electricity. For this reason, e-Ion™ devices leave behind no residues and produce much less emissions than alternative devices. As a new alternative to electron, laser, induction, plasma, and RTP heating methods, MHI's e-Ion Plasma™ uses less energy, produces less noise and is safer than traditional heating methods. All e-Ion Plasma™ devices feature patented technologies developed by MHI.
Plasma polymerization of manyunique polymers and their deposits remain unexplored with this new method
e-Ion Plasma™ Source | e-Ion Zapper™ Furnace | Gen3 LIP System
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Wide Area e-Ion Plasma™ Source
Unique applications for metal melt covers
for dross reduction and for unique
Plasma polymerization for use as solar cells
or films for salt removal |
Standard e-Ion Plasma™ Beam for Brazing and Hardfacing.
Plume discharge above is in air. |
e-Ion Plasma™ Nitrogen Plume
Dicharge is into room air conditions |
e-Ion Plasma™ devices feature a very high energy and power transfer efficiency. At the core of the e-Ion Plasma™ device family is the e-Ion Plasma™ Source. Its robust stainless steel construction, accurate controls and integral fan provide a platform for sustainable overall performance. The e-Ion Plasma™ Source features Clean ElectricFlame™ technology, reducing emissions and saving energy.
An e-Ion Plasma™ Source produces a plume containing ions, electrons, radiation and hot gas. It is a versatile tool with many possible applications, especially in implementations requiring minimization of the heat affected zone. Its rapid heat-up time also makes e-Ion Plasma™ powered devices great for general heat treating, RTP replacements, photonic applications and dozens of other highly specialized applications. e-Ion Plasma is preferrable to chemicals for mitigating dross in an aluminum melting process.
The e-Ion's Wide Area Plasma technology allows for use as an energy efficient plasma covering of nitrogen
Models Available
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Technical Specifications
e-Ion Plasma™ Source Technical Specifications
| 200°C/s Heat-up Rate |
| 3-6.5kW Power Consumption (Depending on Configuration) |
| Highly Modular |
| Compact Table Top Sized |
| Highly Accurate Controls |
| No Water Cooling Required |
| Ability to Treat Ungrounded Metals |
| Stainless Steel Construction, Integrated Fan |
| No Toxic Emissions or Combustion Residues |
| 220/230/240 Input Voltages |
| Single Phase or 3 Phase |
| Near Silent Operation |
Plume Properties
Recombination Temperature ~2500°K
Convective Plasma (variable gas temperature is up to 1600°K)
Heat Transfer Coefficient ~225W/m^2.K.(Compare to 10W/m^2.K) |
Plasma Formation - N2+E -> 2N
2N+e -> 2N+ +2e
Plasma Recombination - 2N+ + 2e -> 2N + E
2N -> N2
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Applications
e-Ion Plasma™ Applications
| Computer Chips and Integrated Circuits |
Waste Processing |
| Computer Hard Drives |
Coatings and Films |
| Electronics RTP Devices Heat >100°C/minute (substrate dependent) |
Advanced Materials (e.g. Ceramics) |
| Machine Tools |
Surface Cleaning |
| Medical Implants and Prosthetics |
High-efficiency Lighting |
| Audio and Video Tapes |
Plasma Enhanced Chemistry |
| Automobile and other High-Value Engine Parts |
Processing of Plastics |
| Printing on Plastic Food Containers |
Gas Treatment |
| Energy-efficient Window Coatings |
Spraying of Materials |
| Cleaning Drinking Water |
Chemical Analysis |
| Voice and Data Communications Components |
Semiconductor Production for Computers |
| Anti-scratch and anti-glare coatings on eyeglasses and other optics |
TV and Electronics |
| Microbial Cleaning |
Custom Applications |
CleanElectricFlame™
e-Ion Plasma™ use compared to Combustion
Issue |
Combustion Flame
(Conventional Plume) |
MHI Advanced LIP System GEN 3
(Clean ElectricFlame™ Plume) |
Emissions, Health & Environment |
- Likely to produce CO2, SO2 and soot
- Uses combustion gas inputs of fuel and air, commonly requiring plumbing
- Typical 20,000 BTU/hr burners produce about 22 moles of greenhouse gasses per hour
- Fossil fuel powered combustion often leads to toxic byproducts such as Carbon Monoxide
- Surfaces impacted by flame may be contaminated with small size soot-like particles
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- Clean ElectricFlame™ technology produces no CO2, SO2 or soot as a byproduct
- No toxic emissions. Air is typical input.
- Electricity powered, no plumbing or piping needed
- No venting required
- Uses only air input, no other gasses
- No greenhouse gasses
- Air to Air. It's like changing your combustion flame to an electric flame
- Highly efficient, saving on energy costs
- Non-toxic
- No residues left because of process
- Improves productivity
- May improve shelf life and quality of products
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Process Impact |
- Narrow area impact when requiring intense flame, non-uniform heat application
- Uniformity requirements may require multiple burners
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- User configurable width of plume
- Higher efficiency
- Requires less monitoring, saving on labor costs
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Explosion Hazards |
- Highly combustible, volatile
- Incomplete combustion may be a down-stream fire hazard
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- No combustible gasses used as inputs
- LIP systems offer integrated over-temperature controls
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Energy Efficiency |
- Flames are energy inefficient, with only around 10% of their energy able to be utilized for heat as quantized radiation may dissipate heat
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- Over 90% energy efficient
- Realized energy savings may approach 80%. (A 30kW combustible flame may be replaced by a 6kW plasma plume)
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Control |
- Lack of precise control
- Frequent quality control issues
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- Precise
- Available built-in safety controls including an over-temperature shut-off
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Noise |
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Odor |
- Noxious odor is often noted from combustion byproducts
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Cost of Operations |
- Consumes expensive reactant gasses
- Frequent downtime leads to lost revenues and costs of repair
- Higher insurance and other costs because of emissions and other flame hazards
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- Uses air and electricity
- No reliance on supply of combustibles
- Less downtime, less lost revenues, less cost of repairs
- Possibility of lower insurance premiums from improved safety
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e-Ion Compared
Comparisons with directed energy systems (Laser to Sunlight)
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e-Ion Plasma™ |
Laser |
Electron Beam |
Sunlight |
Surface Impact |
Beam up to 150mm, large impact, improves productivity. Large area allows for CleanElectricFlame soaking at various power settings.
| Commonly available average beam size is less than 2mm |
Commonly less than 0.5mm beam |
Varies |
Welding/Joining |
Yes, even for dissimilar materials |
Yes, limited by beam parameters |
Yes, limited by beam parameters |
N/A |
Drilling |
N/A |
Yes |
Yes |
Vacuum Always Required? |
No. Plasmize Air to cut down on cost of input gas. |
No |
Yes |
Power Density |
106-109 W/m2 |
106-108 W/m2 for commonly used industrial CO2 continuous lasers. Depends on laser type. |
~106 W/m2 Depends on acceleration voltage and wavelength of beam |
1.3x103 W/m2 (average) |
| Water Requirement |
None. High Energy Efficiency. |
High |
High |
N/A |
Energy Efficiency |
Very high |
Very low |
Very low |
N/A |
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Learn how e-Ion Plasma™ technology can improve your business. Download Plasma Applications for Aluminum Supplement.
You may also view the general benefits and uses of e-Ion Plasma™ technology in the Plasma Ideation Brochure.
MHI (Micropyretics Heaters International Inc.)
750 Redna Terrace
Cincinnati, OH 45215, USA
513-772-0404 phone
513-672-3333 fax
Delivering Quality Since 1995
Contact MHI to design the best
solution for your application.
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